Integrated circuit device and method for manufacturing same

ABSTRACT

According to one embodiment, an integrated circuit device includes a plurality of interconnects and a contact via. The plurality of interconnects are arranged parallel to each other. The contact via is connected to each of the interconnects. A protrusion is formed at a portion of the each of the interconnects connected to the contact via to protrude in a direction of the arrangement. A recess is formed at a portion of the each of the interconnects separated from the portion having the protrusion to recede in the direction of the arrangement. The protrusion formed on one interconnect of two mutually-adjacent interconnects among the plurality of interconnects is opposed to the recess formed in one other interconnect of the two mutually-adjacent interconnects. In the each of the interconnects, the portion having the recess is separated from portions on two sides of the portion having the recess and is separated also from the portion having the protrusion.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is based upon and claims the benefit of priority fromthe prior Japanese Patent Application No. 2011-089082, filed on Apr. 13,2011; the entire contents of which are incorporated herein by reference.

FIELD

Embodiments described herein relate generally to in integrated circuitdevice and a method for manufacturing the same.

BACKGROUND

In recent years, the downscaling of interconnect spacing has progressedas higher integration of integrated circuit devices has progressed. Inparticular, many interconnects are arranged parallel to each other inmemory devices such as MRAM (Magneto resistive Random Access Memory) andthe like because the interconnects are drawn out from multiple memorycells arranged in a matrix configuration. It is possible to utilize asidewall process to reduce the arrangement period of the interconnectsthus arranged parallel to each other. The sidewall process is a methodin which core members are formed in line configurations, slimming of thecore members is performed, sidewalls are formed on two sides of the coremembers, and the core members are subsequently removed. Thereby,multiple sidewalls having an arrangement period of half of thearrangement period of the core members can be formed; and it is possibleto form fine interconnects by using the sidewalls as a mask.

However, it is also necessary to downscale the diameters of the contactvias connected to the interconnects as the interconnects are downscaledusing the sidewall process. Thereby, the formation of the contact viasbecomes difficult; the contact vias become finer; and the resistanceundesirably increases.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 illustrates an integrated circuit device according to a firstembodiment;

FIG. 2 is a plan view illustrating a draw-out region of the integratedcircuit device according to the first embodiment;

FIG. 3 is a cross-sectional view along line A-A′ of FIG. 2;

FIGS. 4A to 4D are process plan views and cross-sectional views ofprocesses, illustrating a method for manufacturing the integratedcircuit device according to the first embodiment;

FIG. 5 is a plan view illustrating the draw-out region of an integratedcircuit device according to a comparative example of the firstembodiment;

FIG. 6 is a plan view illustrating the draw-out region of an integratedcircuit device according to a second embodiment;

FIGS. 7A to 7D are process plan views and cross-sectional views ofprocesses, illustrating a method for manufacturing the integratedcircuit device according to the second embodiment;

FIG. 8 is a plan view illustrating the draw-out region of an integratedcircuit device according to a third embodiment;

FIGS. 9A to 9D are process plan views and cross-sectional views ofprocesses, illustrating a method for manufacturing the integratedcircuit device according to the third embodiment;

FIG. 10 is a plan view illustrating the draw-out region of an integratedcircuit device according to a fourth embodiment;

FIGS. 11A to 11D are process plan views and cross-sectional views ofprocesses, illustrating a method for manufacturing the integratedcircuit device according to the fourth embodiment;

FIGS. 12A to 12D are process plan views and cross-sectional views ofprocesses, illustrating a method for manufacturing the integratedcircuit device according to a fifth embodiment;

FIG. 13 is a plan view illustrating the draw-out region of an integratedcircuit device according to a sixth embodiment;

FIG. 14 is a plan view illustrating the draw-out region of an integratedcircuit device according to a variation of the sixth embodiment;

FIG. 15 is a plan view illustrating the draw-out region of an integratedcircuit device according to a seventh embodiment; and

FIG. 16 is a plan view illustrating the draw-out region of an integratedcircuit device according to a variation of the seventh embodiment.

DETAILED DESCRIPTION

In general, according to one embodiment, an integrated circuit deviceincludes a plurality of interconnects and a contact via. The pluralityof interconnects are arranged parallel to each other. The contact via isconnected to each of the interconnects. A protrusion is formed at aportion of the each of the interconnects connected to the contact via toprotrude in a direction of the arrangement. A recess is formed at aportion of the each of the interconnects separated from the portionhaving the protrusion to recede in the direction of the arrangement. Theprotrusion formed on one interconnect of two mutually-adjacentinterconnects among the plurality of interconnects is opposed to therecess formed in one other interconnect of the two mutually-adjacentinterconnects. The portion having the recess is separated from portionson two sides of the portion having the recess and is separated also fromthe portion having the protrusion, in the each of the interconnects.

In general, according to one embodiment, an integrated circuit deviceincludes a plurality of interconnects and a contact via. The pluralityof interconnects are arranged parallel to each other. The contact via isconnected to each of the interconnects. A bent portion is formed at aportion of the each of the interconnects connected to the contact via tocurve to form a protrusion in one direction of the arrangement. Theplurality of interconnects includes a first interconnect and a secondinterconnect. The second interconnect is adjacent the first interconnectand disposed in the direction of the protrusion of the bent portion ofthe first interconnect as viewed from the first interconnect. Anopposing portion of the second interconnect is opposed to the bentportion of the first interconnect. The opposing portion of the secondinterconnect is separated from portions of the second interconnect ontwo sides of the opposing portion and is separated also from the bentportion of the second interconnect.

In general, according to one embodiment, an integrated circuit deviceincludes a plurality of interconnects and a contact via. The pluralityof interconnects are arranged parallel to each other. The contact via isconnected to each of the interconnects. A bent portion is formed at aportion of the each of the interconnects separated from a portion of theeach of the interconnects connected to the contact via to curve to forma protrusion in one direction of the arrangement. The portion having thebent portion is separated from portions on two sides of the portionhaving the bent portion and is separated also from the portion connectedto the contact via, in the each of the interconnects. The plurality ofinterconnects includes a first interconnect and a second interconnect.The second interconnect is adjacent the first interconnect. The bentportion of the first interconnect is opposed to a portion of the secondinterconnect connected to the contact via. The protrusion of the bentportion of the first interconnect is formed in a direction away from theportion of the second interconnect connected to the contact via.

In general, according to one embodiment, a semiconductor device includesa plurality of first interconnects, a plurality of second interconnects,and a contact via. The plurality of first interconnects are formed overa semiconductor substrate and arranged parallel to each other in a firstdirection. The plurality of second interconnects are formed on aninter-layer insulating film covered the plurality of first interconnectsand arranged parallel to each other in a direction perpendicular to thefirst direction. The contact via is formed at a cross region between alower interconnect of the plurality of first interconnects and an upperinterconnect of the plurality of second interconnects. The lowerinterconnect includes a protrusion formed at a portion connected to thecontact via. The protrusion is protruded in the first direction. One ofthe plurality of first interconnects is adjacent to the lowerinterconnection. The one of the plurality of first interconnectsincludes a recess formed at an opposite side to the protrusion andseparated from the protrusion.

In general, according to one embodiment, a method is disclosed formanufacturing an integrated circuit device. The method can includeforming an insulating film on a substrate. The method can includeforming a plurality of core members extending in one direction on theinsulating film. Each of the plurality of core members includes aprotrusion protruding in a width direction and a recess receding in thewidth direction at positions mutually separated in the one direction.The method can include making the core members finer. The method caninclude forming sidewalls on side surfaces of the core members. Themethod can include removing the core members. The method can includeforming pillars in a first portion and a second portion of a regionbetween two mutually-adjacent sidewalls to link the twomutually-adjacent sidewalls to each other. The first portion is betweena portion of the region having a narrow spacing between the sidewallsand a portion of the region having a wide spacing between the sidewalls.The portion of the region has the narrow spacing between the sidewallsbeing interposed between the first portion and the second portion. Themethod can include making a trench in the insulating film by performingetching using the sidewalls and the pillars as a mask. The method caninclude forming interconnects by filling a conductive material into thetrench. In addition, the method can include forming a contact via toconnect to a portion of each of the interconnects having a width widerthan widths of the other portions of the each of the interconnects.

In general, according to one embodiment, a method is disclosed formanufacturing an integrated circuit device. The method can includeforming a conductive film on a substrate. The method can include forminga plurality of core members extending in one direction on the conductivefilm. Each of the plurality of core members includes a protrusionprotruding in a width direction or a recess receding in the widthdirection formed in one side surface of a first portion and a protrusionprotruding in the width direction or a recess receding in the widthdirection formed in one other side surface of a second portion. Themethod can include making the core members finer. The method can includeforming sidewalls on side surfaces of the core members. The method caninclude removing the core members. The method can include patterning theconductive film into a plurality of interconnects by performing etchingusing the sidewalls as a mask. A bent portion is formed in one locationof each of the plurality of interconnects to curve into a protrudingconfiguration. The plurality of interconnects have a first interconnectand a second interconnect. The second interconnect is adjacent the firstinterconnect and disposed in the direction of the protrusion of the bentportion of the first interconnect as viewed from the first interconnect.The method can include separating an opposing portion of the secondinterconnect opposing the bent portion of the first interconnect fromportions of the second interconnect on two sides of the opposing portionwhile separating the opposing portion from the bent portion of thesecond interconnect. In addition, the method can include forming acontact via to connect to the bent portion.

In general, according to one embodiment, a method is disclosed formanufacturing an integrated circuit device. The method can includeforming a conductive film on a substrate. The method can include forminga plurality of core members extending in one direction on the conductivefilm. Each of the plurality of core members includes a protrusionprotruding in a width direction or a recess receding in the widthdirection formed in one side surface of a first portion and a protrusionprotruding in the width direction or a recess receding in the widthdirection formed in one other side surface of a second portion. Themethod can include making the core members finer. The method can includeforming sidewalls on side surfaces of the core members. The method caninclude removing the core members. The method can include patterning theconductive film into a plurality of interconnects by performing etchingusing the sidewalls as a mask. A bent portion is formed in one locationof each of the plurality of interconnects to curve into a protrudingconfiguration. The plurality of interconnects have a first interconnectand a second interconnect. The second interconnect is adjacent the firstinterconnect. The protrusion of the bent portion of the secondinterconnect is formed in a direction away from the first interconnect.The method can include separating the bent portion of the firstinterconnect from portions of the first interconnect on two sides of thebent portion of the first interconnect while separating the bent portionof the first interconnect from an opposing portion of the firstinterconnect.

The opposing portion is opposed to the bent portion of the secondinterconnect. In addition, the method can include forming a contact viato connect to the opposing portion of each of the interconnects.

Various embodiments will be described hereinafter with reference to theaccompanying drawings.

First, a first embodiment will be described.

FIG. 1 illustrates an integrated circuit device according to theembodiment.

FIG. 2 is a plan view illustrating a draw-out region of the integratedcircuit device according to the embodiment.

FIG. 3 is a cross-sectional view along line A-A′ of FIG. 2.

For easier viewing of the drawing in FIG. 2, only conductive portionsare illustrated; and insulating portions are not illustrated. This issimilar also for similar plan views described below.

As illustrated in FIG. 1, the integrated circuit device 1 according tothe embodiment is a memory device, e.g., an MRAM. In the integratedcircuit device 1, a silicon substrate 10 (referring to FIG. 3) isprovided; memory array regions 11 a and 11 b of two mutually-separatedlocations are provided in the front surface of the silicon substrate 10;and a draw-out region 12 is provided between the memory array regions 11a and 11 b.

Hereinbelow, for convenience of description, a direction from the memoryarray region 11 a toward the memory array region 11 b is taken as a +Xdirection; the reverse direction is taken as a −X direction; and the +Xdirection and the −X direction are generally referred to as the Xdirection. Directions perpendicular to the front surface of the siliconsubstrate 10 are taken as a +Z direction and a −Z direction; anddirections orthogonal to both the X direction and the Z direction aretaken as a +Y direction and a −Y direction.

Multiple memory cells MC are arranged in a matrix configuration in eachof the memory array regions 11 a and 11 b. A common interconnect 14 a isdrawn out from the multiple memory cells MC of the memory array region11 a arranged in one column along the X direction to reach the draw-outregion 12. Similarly, a common interconnect 14 b is drawn out from themultiple memory cells MC of the memory array region 11 b arranged in onecolumn along the X direction to reach the draw-out region 12.

A sense amplifier region 13 is provided on the −Y direction side asviewed from the draw-out region 12. Multiple interconnects 15 extendingin the Y direction are provided between the draw-out region 12 and thesense amplifier region 13. One end of each of the interconnects 15 isconnected to the interconnect 14 a or 14 b by a contact via 16 in thedraw-out region 12. In other words, in the draw-out region 12, theinterconnects 14 a and 14 b drawn out in the X direction (hereinbelowgenerally referred to as the interconnects 14) are connected one-to-oneto the interconnects 15 drawn out in the Y direction by contact viasextending in the Z direction.

As illustrated in FIG. 3, an inter-layer insulating film 21 is providedon the silicon substrate 10; and the interconnects 14 are provided onthe inter-layer insulating film 21. An inter-layer insulating film 22 isprovided on the inter-layer insulating film 21 to cover theinterconnects 14; and the contact vias 16 are buried inside theinter-layer insulating film 22. The interconnects 15 are provided on theinter-layer insulating film 22; and an inter-layer insulating film 23 isprovided to cover the interconnects 15. The interconnects 14 areconnected to the lower ends of the contact vias 16; and theinterconnects 15 are connected to the upper ends of the contact vias 16.

As illustrated in FIG. 2, the interconnect 14 a and the interconnect 14b are arranged to be parallel to each other at uniform spacing. Theinterconnect 14 a and the interconnect 14 b are arranged alternately inthe Y direction. Protrusions 31 are formed in the portions of theinterconnects 14 where the contact vias 16 are connected. The positionsof the interconnects 14 where the contact vias 16 are connected aredifferent from each other in the X direction. In each of theinterconnects 14, a recess 32 is formed in a portion separated in the Xdirection from the portion where the protrusion 31 is formed. In each ofthe interconnects 14, the protrusion 31 is formed on a side surface onthe +Y direction side of the interconnect 14 to protrude in the +Ydirection. The recess 32 is formed in a side surface on the −Y directionside of the interconnect 14 to recede in the +Y direction. In otherwords, in the interconnects 14, the protrusions 31 protrude in the samedirection (the +Y direction); and the recesses 32 recede in the samedirection (the +Y direction).

In two mutually-adjacent interconnects 14, i.e., one interconnect 14 aand the interconnect 14 b adjacent to the interconnect 14 a, theprotrusion 31 formed in one interconnect 14 opposes the recess 32 formedin the other interconnect 14; and the configurations substantiallycorrespond. In other words, as viewed from the Z direction, thepositions in the X direction and the dimensional relationships aresubstantially the same for the portion of one interconnect 14corresponding to the protrusion 31 of the outer edge on the +Y directionside and the portion corresponding to the recess 32 of the outer edge onthe −Y direction side of the adjacent interconnect 14 positioned on the+Y direction side as viewed from the one interconnect 14.

The slits 33 are made in two locations of each of the interconnects 14;and each of the interconnects 14 is divided into three portions.Thereby, in each of the interconnects 14, the portion where the recess32 is formed is separated from portions on two sides of the portionwhere the recess 32 is formed. The portion where the recess 32 is formedalso is separated from the portion where the protrusion 31 is formed.

That is, the integrated circuit device 1 is a semiconductor device. Thedevice 1 includes the plurality of interconnects 14, the plurality ofinterconnects 15, and the contact vias 16. The interconnects 14 areformed over the semiconductor substrate 10. The interconnects 14 arearranged parallel to each other in the X direction. The interconnects 15are formed on the inter-layer insulating film 21 covered theinterconnects 14. The interconnects 15 are arranged parallel to eachother in the Y direction perpendicular to the X direction. The contactvias 16 are formed at a cross region between a lower interconnect and anupper interconnect. The lower interconnect is one of the plurality ofinterconnects 14. The upper interconnect is one of the plurality ofinterconnects 15. The lower interconnect includes the protrusion 31formed at a portion connected to the contact via 16. The protrusion 31is protruded in the X direction. One of the interconnects 14 that isadjacent to the lower interconnection includes the recess 32 formed atan opposite side to the protrusion 31. The recess 32 is separated fromthe protrusion 31.

A method for manufacturing the integrated circuit device according tothe embodiment will now be described.

FIGS. 4A to 4D are process plan views and cross-sectional views ofprocesses, illustrating the method for manufacturing the integratedcircuit device according to the embodiment.

In each of the drawings, the drawing on the left is a process plan view;and the drawing on the right is a cross-section& view of the process.The cross-sectional views of processes are cross-sectional views alongline B-B′ of the process plan views respectively. For convenience ofillustration in the process plan views, the core members, the sidewalls,the pillars, and the interconnects are marked with dots. This is similarfor FIGS. 7A to 7D, FIGS. 9A to 9D, FIGS. 11A to 11D, and FIGS. 12A to12D described below.

In the embodiment, the interconnect 14 is formed using a sidewallprocess and a damascene process.

First, as illustrated in FIG. 3, a prescribed drive circuit is formed inthe front surface of the silicon substrate 10. For example, the memorycells MC (referring to FIG. 1) are formed in the memory array regions 11a and 11 b while forming sense amplifiers (not illustrated) in the senseamplifier region 13. Then, the inter-layer insulating film 21 is formedon the silicon substrate 10.

Then, as illustrated in FIG. 4A, an insulating film 41 is formed on theinter-layer insulating film 21. Continuing, multiple core members 42 areformed on the insulating film 41. Each of the core members 42 is formedin a line configuration extending in the X direction; and a protrusion43 and a recess 44 are formed at positions mutually separated in the Xdirection. The protrusion 43 protrudes from the side surface of the coremember 42 on the +Y direction side by the dimension t in the +Ydirection. On the other hand, the recess 44 recedes from the sidesurface of the core member 42 on the −Y direction side by the dimensiont in the +Y direction. In the multiple core members 42, all of thepositions of the protrusions 43 and the positions of the recesses 44 inthe X direction are different from each other.

Continuing as illustrated in FIG. 4B, slimming is performed on the coremembers 42 to make the core members 42 finer. At this time, theprotruded amount of the protrusion 43 and the receded amount of therecess 44 are reduced but remain.

Then, as illustrated in FIG. 4C, sidewalls 45 are formed on the sidesurfaces of the core members 42 by depositing, for example, a siliconnitride film on the entire surface and performing etch-back. Continuing,the core members 42 are removed. Thereby, the multiple sidewalls 45extending in the X direction remain on the insulating film 41. At thistime, the arrangement period of the sidewalls 45 is half of thearrangement period of the core members 42. The portion of the sidewall45 formed on the side surface of the protrusion 43 of the core member 42is a curved portion 46 that is curved along the side surface of theprotrusion 43. Similarly, the portion of the sidewall 45 formed on theside surface of the recess 44 of the core member 42 is a curved portion46 that is curved along the side surface of the recess 44. Because theposition of the curved portion 46 in the X direction is differentbetween the multiple sidewalls 45, the straight portions of the adjacentsidewalls 45 are positioned adjacently in the two Y directions as viewedfrom the curved portion 46 of one sidewall 45. Accordingly, asillustrated as a region a in FIG. 4C, there is a narrow spacing to theadjacent sidewall 45 on the side of the protrusion of the curved portion46. On the other hand, as illustrated as a region 13 in FIG. 4C, thereis a wide spacing to the adjacent sidewall 45 on the side of the recessof the curved portion 46.

Continuing, pillars 47 are formed in a portion of the region between themutually-adjacent sidewalls 45 to link the sidewalls 45 to each other.Specifically, the pillars 47 are formed in a first portion and a secondportion of the region between the mutually-adjacent sidewalls 45. Thefirst portion is between a portion of the region between themutually-adjacent sidewalls 45 where the spacing between the sidewalls45 is narrow and a portion of the region between the mutually-adjacentsidewalls 45 where the spacing between the sidewalls 45 is wide. Theportion where the spacing between the sidewalls 45 is narrow isinterposed between the first portion and the second portion. The pillars47 are formed by, for example, depositing a mask material on the entiresurface and by subsequently selectively removing the mask material usinglithography. The pillars 47 are formed of a material that has etchingselectivity with the insulating film 41 and the sidewalls 45. Thepillars 47 are formed of, for example, a coating-type organic film inthe case where, for example, the insulating film 41 is formed of siliconoxide and the sidewalls 45 are formed of silicon nitride. Specifically,the pillars 47 are formed by forming an organic film by coating, forminga silicon oxide film thereon by coating, forming a resist film thereon,patterning the resist film, transferring the pattern of the resist filmonto the silicon oxide film, and then transferring the pattern onto theorganic film.

Then, as illustrated in FIG. 4D, etching such as RIE (reactive ionetching), etc., is performed using the sidewalls 45 and the pillars 47as a mask. Thereby, multiple trenches 48 are made in the portions of theinsulating film 41 excluding the regions directly under the sidewalls 45and the pillars 47. In other words, the pattern of the sidewalls 45 andthe pillars 47 is inverted and transferred onto the insulating film 41of the lower layer. In each of the trenches 48, a portion having a widthwider than those of the other portions and a portion having a widthnarrower than those of the other portions are formed on two sides of theregion directly under the curved portion 46 of the sidewall 45. Thetrenches 48 are discontinuous in the regions directly under the pillars47. Subsequently, the sidewalls 45 and the pillars 47 are removed.

Continuing, a conductive material is filled into the trenches 48.Thereby, the interconnects 14 are formed inside the trenches 48. At thistime, the protrusion 31 and the recess 32 are formed respectively in theinterconnects 14 on two sides of the region directly under the curvedportion 46 of the sidewall 45. The region directly under the pillar 47becomes the slit 33 without the interconnect 14 being formed. In such acase, in the process illustrated in FIG. 4A described above, all of thepositions of the protrusions 31 in the X direction are different fromeach other because all of the positions of the protrusions 43 and thepositions of the recesses 44 in the X direction are different from eachother.

Then, as illustrated in FIG. 2 and FIG. 3, the inter-layer insulatingfilm 22 is formed on the insulating film 41 and the interconnects 14.Continuing, contact via holes are made in the inter-layer insulatingfilm 22 using, for example, lithography. The contact via hole is made toreach the portion of each of the interconnects 14 having the width widerthan those of the other portions, i.e., the portion where the protrusion31 is formed. Then, the contact vias 16 are formed by filling aconductive material into the contact via holes. The lower end of thecontact via 16 is connected to the portion of each of the interconnects14 having the width wider than those of the other portions. Thus, one ofthe contact vias 16 is connected to each of the interconnects 14. Then,the multiple interconnects 15 extending in the Y direction are formed onthe inter-layer insulating film 22. Each of the interconnects 15 isconnected to the upper end of one of the contact vias 16. Then, theinter-layer insulating film 23 is formed on the inter-layer insulatingfilm 22 to cover the interconnects 15. Thereby, the integrated circuitdevice 1 is manufactured.

Operational effects of the embodiment will now be described.

In the embodiment, the arrangement period of the interconnects 14 can besmaller because the interconnects 14 are formed using the sidewallprocess. Thereby, higher integration of the integrated circuit device 1can be realized.

Normally, in the sidewall process, the widths and the spacing of theinterconnects are uniform because the widths of the sidewalls areuniform.

Conversely, in the embodiment, the protrusion 43 and the recess 44 areformed in the core member 42 in the process illustrated in FIG. 4A.Thereby, the curved portion 46 is formed in the sidewall 45 in theprocess illustrated in FIG. 4C; and the protrusion 31 and the recess 32are formed in the interconnect 14 in the process illustrated in FIG. 4D.As a result, the portion of the interconnect 14 where the protrusion 31is formed is wider than the other portions. Because the contact via 16is connected to the portion where the protrusion 31 is formed, thediameter of the contact via 16 can be larger even when anticipatingmargins for the alignment shift and the fluctuation of the dimensions ofthe contact via 16. Therefore, the degree of difficulty of thelithography when making the contact via holes in the inter-layerinsulating film 22 is reduced; and the formation of the contact vias 16is easier. Thereby, the cost of the manufacturing equipment can bereduced; and the manufacturing cost can be reduced. The resistance ofthe contact vias 16 can be reduced by increasing the diameters of thecontact vias 16. Thereby, the reliability and the yield of theintegrated circuit device increase.

Because the protrusion 31 and the recess 32 of the interconnect 14 areformed on two sides of the curved portion 46 of the sidewall 45, theprotrusion 31 of one interconnect 14 of two mutually-adjacentinterconnects 14 opposes the recess 32 of the other interconnect 14.Thereby, the interconnects 14 do not short easily to each other even inthe case where the protrusions 31 are formed because the distancebetween the interconnects 14 is maintained at substantially a constant.

In the embodiment, the pillars 47 are formed at prescribed positionsbetween the sidewalls 45 in the process illustrated in FIG. 4C. Thereby,the slits 33 are made in the interconnect 14; and the portion of theinterconnect 14 where the recess 32 is formed is separated from portionsof the same interconnect 14 on two X-direction sides while beingseparated from the portion where the protrusion 31 is formed, i.e., theportion where the contact via 16 is connected; and the portion of theinterconnect 14 where the recess 32 is formed is in an electricallyfloating state. Therefore, even in the case where the contact via 16connected to one interconnect 14 is shorted to the recess 32 of anadjacent interconnect 14, problems do not occur because the shortedportion of the adjacent interconnect 14 is in a floating state.

A comparative example of the embodiment will now be described.

FIG. 5 is a plan view illustrating the draw-out region of an integratedcircuit device according to the comparative example.

In the comparative example as illustrated in FIG. 5, interconnects 114are formed using a normal sidewall process. Each of the interconnects114 is divided in one location.

As illustrated in FIG. 5, although it is possible to reduce thearrangement period of the interconnects 114 in the case where theinterconnects 114 are formed using the sidewall process, the widths andthe spacing of the interconnects 114 are uniform. Therefore, in the casewhere a contact via 116 is formed to connect to each of theinterconnects 114, it is necessary to make the contact via 116sufficiently fine to prevent the contact via 116 from shorting to theinterconnect 114 adjacent to the interconnect 114 to be connected to. Asa result, as the interconnects 114 are downscaled, the contact vias 116also become finer; the formation of the contact vias 116 becomesdifficult; and the resistance of the contact vias 116 undesirablyincreases.

For example, it is assumed that there is no dimensional fluctuation ofthe contact via and that the alignment shift of the contact via is notmore than half of the arrangement period of the interconnects. In such acase, in the comparative example, it is necessary for the diameter ofthe contact via 116 to be not more than half of the arrangement periodof the interconnects 114 to prevent the contact via 116 from shorting tothe interconnect 114 adjacent to the interconnect 114 to be connectedto. As downscaling is performed, in addition to the formation of thecontact vias themselves becoming difficult, the resistance increase ofthe contact vias also can no longer be ignored. Conversely, in the firstembodiment, the diameter of the contact via 16 can be increased to 1.5times the arrangement period of the interconnects 14 because problems donot occur even in the case where the contact via 16 is shorted to theinterconnect 14 adjacent to the interconnect 14 to be connected to.

A second embodiment will now be described.

FIG. 6 is a plan view illustrating the draw-out region of an integratedcircuit device according to the embodiment.

As illustrated in FIG. 6, the integrated circuit device 2 according tothe embodiment differs from the integrated circuit device 1 according tothe first embodiment described above (referring to FIG. 2) in that thedirections in which the protrusions 31 of two mutually-adjacentinterconnects 14 protrude are opposite to each other. For example, inthe example illustrated in FIG. 6, the protrusion 31 of the interconnect14 a protrudes in the −Y direction; and the protrusion 31 of theinterconnect 14 b protrudes in the +Y direction.

A method for manufacturing the integrated circuit device according tothe embodiment will now be described.

FIGS. 7A to 7D are process plan views and cross-sectional views ofprocesses, illustrating the method for manufacturing the integratedcircuit device according to the embodiment.

In the embodiment as illustrated in FIG. 7A, the protrusion 43 and therecess 44 are formed in the side surface on the same side of the coremember 42, e.g., in the side surface on the +Y direction side, whenforming the core members 42 on the insulating film 41. In other words,the protrusion 43 protrudes from the side surface of the core member 42on the +Y direction side by the dimension a in the +Y direction. On theother hand, the recess 44 recedes from the side surface of the coremember 42 on the +Y direction side by the dimension a in the −Ydirection.

The subsequent processes are similar to those of the first embodimentdescribed above. In other words, slimming of the core members 42 isperformed as illustrated in FIG. 7B; and the sidewalls 45 are formed onthe two side surfaces of the core members 42 as illustrated in FIG. 7C.In such a case, a sidewall 45 having the curved portion 46 formed in twolocations is arranged alternately with a sidewall 45 in which the curvedportions 46 are not formed. The curved portions 46 formed in the twolocations of the same sidewall 45 have protrusions in mutually oppositedirections. Then, the trenches 48 are made by etching the insulatingfilm 41 using the sidewalls 45 and the pillars 47 as a mask; and theinterconnects 14 are formed by filling a conductive material into thetrenches 48. Thereby, the integrated circuit device 2 illustrated inFIG. 6 is manufactured.

Otherwise, the configuration, the manufacturing method, and theoperational effects of the embodiment are similar to those of the firstembodiment described above.

A third embodiment will now be described.

FIG. 8 is a plan view illustrating the draw-out region of an integratedcircuit device according to the embodiment.

As illustrated in FIG. 8, the integrated circuit device 3 according tothe embodiment differs from the integrated circuit device 1 according tothe first embodiment described above (referring to FIG. 2) in that abent portion (a curved portion) 51 is formed in each of theinterconnects 14 instead of the protrusion 31 (referring to FIG. 2). Atthe bent portion 51, the interconnect 14 is curved to form a protrusiontoward one direction. In the embodiment, the direction of the protrusionof the bent portion 51, e.g., the +Y direction, is the same for all ofthe interconnects 14. The width of the interconnect at the bent portion51 is substantially the same as the widths of the portions of theinterconnect 14 other than the bent portion 51.

The position of the bent portion 51 in the X direction is differentbetween the interconnects 14. Therefore, the straight portions of theadjacent interconnects 14 are positioned adjacently in the two Ydirections as viewed from the bent portion 51 of one interconnect 14.Accordingly, as illustrated as the region a in FIG. 8, there is a narrowspacing to the adjacent interconnect 14 on the side of the protrusion ofone bent portion 51 as viewed from the bent portion 51. On the otherhand, as illustrated as the region (3 in FIG. 8, there is a wide spacingto the adjacent interconnect 14 on the side of the recess of the bentportion 51. The lower end of the contact via 16 is connected to the bentportion 51 of each of the interconnects 14. Because the bent portion 51has a protrusion in the +Y direction, the central axis of the contactvia 16 is displaced toward the +Y direction side with respect to thecentral axis of the portions of the interconnect 14 other than the bentportion 51 as viewed from the Z direction.

The slits 33 are made in two locations of each of the interconnects 14;and each of the interconnects 14 is divided into three. In other words,an opposing portion 52 of a second interconnect 14 adjacent to a firstinterconnect 14 and disposed in the direction of the protrusion of thebent portion 51 of the first interconnect 14 as viewed from the firstinterconnect 14 to oppose the bent portion 51 of the first interconnect14 is separated from portions of the second interconnect 14 on two sidesof the opposing portion 52 and is separated also from the bent portion51 of the second interconnect 14. Accordingly, the opposing portion 52is in an electrically floating state.

Otherwise, the configuration of the embodiment is similar to that of thefirst embodiment described above.

A method for manufacturing the integrated circuit device according tothe embodiment will now be described.

FIGS. 9A to 9D are process plan views and cross-sectional views ofprocesses, illustrating the method for manufacturing the integratedcircuit device according to the embodiment.

In the embodiment, the interconnects 14 are formed using the sidewallprocess and etching.

First, as illustrated in FIG. 9A, the inter-layer insulating film 21 isformed on the silicon substrate 10 (referring to FIG. 3); and aconductive film 61 is formed thereon. Then, multiple core members 62extending in the X direction are formed on the conductive film 61. Theconfiguration of the core members 62 is the same as the configuration ofthe core members 42 of the first embodiment described above (referringto FIG. 4A). In other words, a protrusion 63 protruding by the dimensiont in the +Y direction is formed on the side surface on the +Y directionside of the first portion of each of the core members 62; and a recess64 receding by the dimension t in the +Y direction is formed in the sidesurface on the −Y direction side of the second portion separated fromthe first portion. For the multiple core members 62, all of thepositions of the protrusions 63 and the positions of the recesses 64 inthe X direction are different from each other.

Then, as illustrated in FIG. 9B, slimming is performed on the coremembers 62 to make the core members 62 finer.

Continuing as illustrated in FIG. 9C, sidewalls 65 are formed on theside surfaces of the core members 62. Then, the core members 62 areremoved. The configuration of the sidewalls 65 is the same as that ofthe sidewalls 45 of the first embodiment described above (referring toFIG. 4C). In other words, the portion of the sidewall 65 formed on theside surface of the protrusion 63 of the core member 62 is a curvedportion 66 that is curved along the side surface of the protrusion 63.Similarly, the portion of the sidewall 65 formed on the side surface ofthe recess 64 of the core member 62 is a curved portion 66 that iscurved along the side surface of the recess 64. Because the position ofthe curved portion 66 in the X direction is different between themultiple sidewalls 65, the straight portions of the adjacent sidewalls65 are positioned adjacently in the two Y directions as viewed from thecurved portion 66 of one sidewall 65. Accordingly, as viewed from thecurved portion 66, there is a narrow spacing to the adjacent sidewall 65on the side of the protrusion of the curved portion 66 as illustrated asthe region α; and there is a wide spacing to the adjacent sidewall 65 onthe side of the recess of the curved portion 66 as illustrated as theregion β.

Then, as illustrated in FIG. 9D, etching such as RIE, etc., is performedusing the sidewalls 65 as a mask. Thereby, the conductive film 61 ispatterned into the multiple interconnects 14 by removing the portions ofthe conductive film 61 excluding the regions directly under thesidewalls 65. At this time, the portions of the conductive film 61positioned in the regions directly under the sidewalls 65 become theinterconnects 14; and the portions positioned in the regions directlyunder the curved portions 66 become the bent portions 51. In otherwords, the pattern of the sidewalls 65 is transferred as-is onto theconductive film 61 of the lower layer. Subsequently, the sidewalls 65are removed.

Continuing as illustrated in FIG. 8, a resist mask (not illustrated) isformed by forming a resist film to cover the interconnects 14 and bypatterning by exposing and developing. Then, the interconnects 14 areselectively removed by etching using the resist mask as a mask. Thereby,each of the interconnects 14 is divided into three by making the slits33 in two locations of each of the interconnects 14. At this time, theopposing portion 52 of the second interconnect 14 adjacent to the firstinterconnect 14 and disposed in the direction of the protrusion of thebent portion 51 as viewed from the first interconnect 14 to oppose thebent portion 51 of the first interconnect 14 is separated from portionsof the second interconnect 14 on two sides of the opposing portion 52and is separated also from the bent portion 51 of the secondinterconnect 14. Also, at this time, two slits having straight lineconfigurations extending in the Y direction are made in the resist mask;and portions of the interconnects 14 extending around the two endportions of the sidewalls 65 are divided simultaneously. The patterningof the interconnects 14 is performed, for example, by etching once usingone resist pattern.

Then, the inter-layer insulating film 22 is formed on the inter-layerinsulating film 21 and the interconnects 14. Continuing, contact viaholes are made in the inter-layer insulating film 22 using, for example,lithography. The contact via hole is made to reach the portion of eachof the interconnects 14 where the bent portion 51 is formed. In such acase, the central axis of the contact via hole is positioned on thecentral axis of the bent portion 51 as viewed from the Z direction.Because the bent portion 51 has a protrusion on the +Y direction side,the contact via hole is displaced further toward the +Y direction sidethan are the portions of the interconnect 14 other than the bent portion51.

Continuing, the contact vias 16 are formed by filling a conductivematerial into the contact via holes. The lower end of the contact via 16is connected to the bent portion 51 of each of the interconnects 14.Then, the multiple interconnects 15 extending in the Y direction areformed on the inter-layer insulating film 22; and the inter-layerinsulating film 23 is formed to cover the interconnects 15. Thereby, theintegrated circuit device 3 is manufactured.

Otherwise, the manufacturing method of the embodiment is similar to thatof the first embodiment described above.

Operational effects of the embodiment will now be described.

In the embodiment as well, similarly to the first and second embodimentsdescribed above, the arrangement period of the interconnects 14 can besmaller because the interconnects 14 are formed using the sidewallprocess. Thereby, higher integration of the integrated circuit device 3can be realized.

In the embodiment, the protrusion 63 and the recess 64 are formed in thecore member 62 in the process illustrated in FIG. 9A. Thereby, thecurved portion 66 is formed in the sidewall 65 in the processillustrated in FIG. 9C; and the bent portion 51 is formed in theinterconnect 14 in the process illustrated in FIG. 9D. Then, the contactvia 16 is connected to the portion where the bent portion 51 is formed.Therefore, the central axis of the contact via 16 is displaced furthertoward the +Y direction side than is the central axis of theinterconnect 14.

Thereby, the distance from the contact via 16 connected to the firstinterconnect 14 to the adjacent second interconnect 14 positioned on the−Y direction side as viewed from the first interconnect 14 is large; andthe contact via 16 does not easily short to the second interconnect 14.On the other hand, although the distance from the contact via 16connected to the first interconnect 14 to an adjacent third interconnect14 positioned on the +Y direction side as viewed from the firstinterconnect 14 is small, problems do not occur even in the case wherethe, contact via 16 is shorted to the third interconnect 14 because theopposing portion 52 of the third interconnect 14 opposing the bentportion 51 of the first interconnect 14 is in an electrically floatingstate. Thereby, the diameters of the contact vias 16 can be larger evenwhen anticipating margins for the alignment shift and the fluctuation ofthe dimensions of the contact vias 16. As a result, the formation of thecontact vias 16 is easy and the resistance of the contact vias 16decreases.

In the embodiment, the slits 33 are made in the interconnects 14 in thesame process as the division of the portions of the interconnects 14extending around the sidewalls 65; and these are performed, for example,by etching once using the same single resist mask. The division of theportions extending around the sidewalls 65 is a process necessary toseparate the interconnects 14 from each other even in the case where thebent portions 51 are not formed in the interconnects 14. Accordingly, inthe embodiment, it is unnecessary to provide a new process to make theslits 33.

A fourth embodiment will now be described.

FIG. 10 is a plan view illustrating the draw-out region of an integratedcircuit device according to the embodiment.

As illustrated in FIG. 10, the integrated circuit device 4 according tothe embodiment differs from the integrated circuit device 3 according tothe third embodiment described above (referring to FIG. 8) in that thedirections of the protrusions of the bent portions 51 of the twomutually-adjacent interconnects 14 are opposite to each other. Forexample, the bent portion 51 of the interconnect 14 a has a protrusionin the −Y direction; and the bent portion 51 of the interconnect 14 bhas a protrusion in the +Y direction.

A method for manufacturing the integrated circuit device according tothe embodiment will now be described.

FIGS. 11A to 11D are process plan views and cross-sectional views ofprocesses, illustrating the method for manufacturing the integratedcircuit device according to the embodiment.

In the embodiment as illustrated in FIG. 11A, the protrusion 63 isformed in two locations of the core member 62 when forming the coremembers 62 on the conductive film 61. In other words, in each of thecore members 62, the protrusion 63 protruding by the dimension t in the+Y direction is formed on the side surface on the +Y direction side of afirst portion; and the protrusion 63 protruding by the dimension t inthe −Y direction is formed on the side surface on the −Y direction sideof a second portion separated from the first portion. For the multiplecore members 62, all of the positions of the protrusions 63 in the Xdirection are different from each other. In the embodiment, the recesses64 (referring to FIG. 9A) are not formed in the core members 62.

The subsequent processes are similar to those of the third embodimentdescribed above. In other words, slimming of the core members 62 isperformed as illustrated in FIG. 11B; and the sidewalls 65 are formed onthe two side surfaces of the core members 62 as illustrated in FIG. 11C.At this time, the curved portions 66 of two mutually-adjacent sidewalls65 have protrusions in mutually opposite directions. Then, theconductive film 61 is patterned into the multiple interconnects 14 byetching the conductive film 61 using the sidewalls 65 as a mask.Thereby, the integrated circuit device 4 illustrated in FIG. 10 ismanufactured.

In the embodiment, it is sufficient to form only the protrusion 63 inthe core member 62 in the process illustrated in FIG. 11A; and theformation of the core members 62 is easy because it is unnecessary toform the recess 64.

Otherwise, the configuration, the manufacturing method, and theoperational effects of the embodiment are similar to those of the thirdembodiment described above.

A fifth embodiment will now be described.

The configuration of the integrated circuit device according to theembodiment is similar to that of the fourth embodiment described above(referring to FIG. 10).

FIGS. 12A to 12D are process plan views and cross-sectional views ofprocesses, illustrating the method for manufacturing the integratedcircuit device according to the embodiment.

The embodiment differs from the fourth embodiment described above inthat the recess 64 is formed instead of the protrusion 63 when formingthe core members 62.

In other words, as illustrated in FIG. 12A, the recess 64 is formed intwo locations of the core member 62 when forming the core members 62 onthe conductive film 61. In other words, the recess 64 receding by thedimension t in the −Y direction is formed in the side surface on the +Ydirection side of the first portion of each of the core members 62; andthe recess 64 receding by the dimension t in the +Y direction is formedin the side surface on the −Y direction side of the second portionseparated from the first portion. For the multiple core members 62, allof the positions of the recesses 64 in the X direction are differentfrom each other. In the embodiment, the protrusions 63 (referring toFIG. 9A) are not formed on the core members 62. The subsequent processesare similar to those of the third embodiment described above.

Otherwise, the configuration, the manufacturing method, and theoperational effects of the embodiment are similar to those of the fourthembodiment described above.

A sixth embodiment will now be described.

FIG. 13 is a plan view illustrating the draw-out region of an integratedcircuit device according to the embodiment.

As illustrated in FIG. 13, the integrated circuit device 6 according tothe embodiment differs from the integrated circuit device 3 according tothe third embodiment described above (referring to FIG. 8) in that thecontact via 16 is connected to the straight portion of the interconnect14 instead of the bent portion 51 of the interconnect 14.

In each of the interconnects 14, the bent portion 51 curved to form aprotrusion in the +Y direction is formed in a portion separated from theportion where the contact via 16 is connected. The bent portion 51 iscurved to detour around the contact via 16 connected to the adjacentinterconnect 14. In other words, the bent portion 51 of the firstinterconnect 14 opposes the portion of the second interconnect 14adjacent to the first interconnect 14 where the contact via 16 isconnected and has a protrusion in a direction away from the portion ofthe second interconnect 14 where the contact via 16 is connected. Ineach of the interconnects 14, the portion where the bent portion 51 isformed is separated from portions on two sides thereof and is separatedalso from the portion where the contact via 16 is connected.Accordingly, the portion of the interconnect 14 where the bent portion51 is formed is in an electrically floating state.

A method for manufacturing the integrated circuit device according tothe embodiment will now be described.

First, the multiple interconnects 14 having the bent portion 51 formedin one location of each are formed on the inter-layer insulating film 21using the methods illustrated in FIGS. 9A to 9D.

Then, as illustrated in FIG. 13, a resist mask (not illustrated) isformed by forming a resist film to cover the interconnects 14 and bypatterning by exposing and developing. Continuing, the interconnects 14are selectively removed by performing etching using the resist mask as amask. Thereby, each of the interconnects 14 is divided into threeportions by making the slits 33 in two locations of each of theinterconnects 14.

At this time, in each of the interconnects 14, the bent portion 51 isseparated from portions on two sides thereof and is separated also fromthe portion where the contact via 16 is to be connected. In other words,the bent portion 51 of the first interconnect 14 is separated fromportions of the first interconnect 14 on two sides of the bent portion51 and is separated from the opposing portion 52 of the firstinterconnect 14 that opposes the bent portion 51 of the secondinterconnect 14 adjacent to the first interconnect, where the bentportion 51 of the second interconnect 14 has a protrusion in a directionaway from the first interconnect 14.

At this time, two slits having straight line configurations extending inthe Y direction are made in the resist mask; and the portions of theinterconnects 14 extending around the two end portions of the sidewalls65 are divided simultaneously. The patterning of the interconnects 14 isperformed, for example, by etching once using one resist pattern.

Then, the inter-layer insulating film 22 is formed on the inter-layerinsulating film 21 and the interconnects 14. Continuing, contact viaholes are made in the inter-layer insulating film 22 using, for example,lithography. The contact via holes are formed to reach the opposingportions 52. Then, the contact vias 16 are formed by filling aconductive material into the contact via holes. Continuing, the multipleinterconnects 15 extending in the Y direction are formed on theinter-layer insulating film 22; and the inter-layer insulating film 23is formed to cover the interconnects 15. Thereby, the integrated circuitdevice 6 is manufactured.

Operational effects of the embodiment will now be described.

In the embodiment as well, similarly to the embodiments described above,the arrangement period of the interconnects 14 can be smaller becausethe interconnects 14 are formed using the sidewall process. Thereby,higher integration of the integrated circuit device 3 can be realized.

In the embodiment as well, for reasons described below, the diameter ofthe contact via 16 can be increased. In other words, one interconnect 14is taken as a first interconnect; the adjacent interconnect 14 disposedon the +Y direction side as viewed from the first interconnect is takenas a second interconnect; and the adjacent interconnect 14 disposed onthe −Y direction side as viewed from the first interconnect is taken asa third interconnect. For example, in FIG. 13, a distance L1 between asecond interconnect 14 f and the contact via 16 connected to a firstinterconnect 14 e can be increased and shorts can be prevented becausethe bent portion 51 of the second interconnect 14 f has a protrusion ina direction away from the contact via 16 connected to the firstinterconnect, where the interconnects 14 e, 14 f, and 14 g are thefirst, the second, and the third interconnect, respectively. On theother hand, a distance L2 between the first interconnect 14 e and thebent portion 51 of the third interconnect 14 g is small because the bentportion 51 of the third interconnect 14 g has a protrusion in adirection toward the first interconnect. However, problems do not occureven in the case where the bent portion 51 of the third interconnect 14g is shorted to the first interconnect 14 e because the bent portion 51of each of the interconnects 14 is in an electrically floating state.Thereby, the contact via 16 can be formed with a larger diameter. As aresult, the formation of the contact vias 16 is easy and the resistanceof the contact vias 16 decreases.

In the embodiment, similarly to the third embodiment described above,the slits 33 of the interconnects 14 are made in the same process as thedivision of the portions of the interconnects 14 extending around thesidewalls 65. Therefore, it is unnecessary to provide a new process tomake the slits 33.

Otherwise, the configuration, the manufacturing method, and theoperational effects of the embodiment are similar to those of the thirdembodiment described above.

A variation of the sixth embodiment will now be described.

FIG. 14 is a plan view illustrating the draw-out region of an integratedcircuit device according to the variation.

As illustrated in FIG. 14, the integrated circuit device 6 a accordingto the variation differs from the integrated circuit device 6 accordingto the sixth embodiment described above (referring to FIG. 13) in thatthe bent portion 51 of the interconnect 14 contacts the adjacentinterconnect 14. In the case where the protruded amount of the bentportion 51 is not less than half of the arrangement period of theinterconnects 14 due to, for example, fluctuation of the processconditions, etc., when manufacturing the integrated circuit device 6(referring to FIG. 13), the bent portion 51 undesirably contacts andshorts to the adjacent interconnect 14 as in the variation. However,problems do not occur even in such a case because the bent portion 51 isin a floating state.

Otherwise, the configuration, the manufacturing method, and theoperational effects of the variation are similar to those of the sixthembodiment described above.

A seventh embodiment will now be described.

FIG. 15 is a plan view illustrating the draw-out region of an integratedcircuit device according to the embodiment.

As illustrated in FIG. 15, the integrated circuit device 7 according tothe embodiment differs from the integrated circuit device 6 according tothe sixth embodiment described above (referring to FIG. 13) in that thedirections of the protrusions of the bent portions 51 of the twomutually-adjacent interconnects 14 are opposite to each other. Forexample, the bent portion 51 of the interconnect 14 a has a protrusionin the +Y direction; and the bent portion 51 of the interconnect 14 bhas a protrusion in the −Y direction.

A method for manufacturing the integrated circuit device according tothe embodiment will now be described.

In the embodiment, for example, the interconnects 14 are formed by themethods illustrated in FIGS. 11A to 11D. In other words, the multipleinterconnects 14 are formed using the sidewall process and etching usingthe core members 62 in which the protrusion 63 is formed on both sidesurfaces. Or, the interconnects 14 are formed by the methods illustratedin FIGS. 12A to 12D. In other words, the multiple interconnects 14 areformed using the sidewall process and etching using the core members 62in which the recess 64 is formed on both side surfaces. Thereby, thedirections of the protrusions of the bent portions 51 of the twomutually-adjacent interconnects 14 are opposite to each other.

Then, the contact vias 16 are formed using methods similar to those ofthe sixth embodiment described above to connect to the opposing portions52 of the interconnects 14, where the bent portions 51 of the adjacentinterconnects 14 detour around the opposing portions 52. Subsequently,the interconnects 15 are formed. Thus, the integrated circuit device 7is manufactured.

Otherwise, the configuration, the manufacturing method, and theoperational effects of the embodiment are similar to those of the sixthembodiment described above.

A variation of the seventh embodiment will now be described.

FIG. 16 is a plan view illustrating the draw-out region of an integratedcircuit device according to the variation.

In the integrated circuit device 7 a according to the variation asillustrated in FIG. 16, the bent portions 51 of two interconnects 14 cand 14 d have protrusions in directions toward each other. Therefore,the distance between the interconnect 14 c and the interconnect 14 d issmall. However, problems do not occur even in the case where theinterconnect 14 c shorts to the interconnect 14 d because both of theinterconnects 14 c and 14 d are in electrically floating states.

Otherwise, the configuration, the manufacturing method, and theoperational effects of the variation are similar to those of the seventhembodiment described above.

According to the embodiments described above, an integrated circuitdevice in which the contact vias are formed easily and have lowresistance and a method for manufacturing the same can be realized.

While certain embodiments have been described, these embodiments havebeen presented by way of example only, and are not intended to limit thescope of the inventions. Indeed, the novel embodiments described hereinmay be embodied in a variety of other forms; furthermore, variousomissions, substitutions and changes in the form of the embodimentsdescribed herein may be made without departing from the spirit of theinventions. The accompanying claims and their equivalents are intendedto cover such forms or modifications as would fall within the scope andspirit of the invention. The above embodiments can be practiced incombination with each other.

1.-11. (canceled)
 12. A method for manufacturing an integrated circuitdevice, comprising: forming an insulating film on a substrate; forming aplurality of core members extending in one direction on the insulatingfilm, each of the plurality of core members including a protrusionprotruding in a width direction and a recess receding in the widthdirection at positions mutually separated in the one direction; makingthe core members finer; forming sidewalls on side surfaces of the coremembers; removing the core members; forming pillars in a first portionand a second portion of a region between two mutually-adjacent sidewallsto link the two mutually-adjacent sidewalls to each other, the firstportion being between a portion of the region having a narrow spacingbetween the sidewalls and a portion of the region having a wide spacingbetween the sidewalls, the portion of the region having the narrowspacing between the sidewalls being interposed between the first portionand the second portion; making a trench in the insulating film byperforming etching using the sidewalls and the pillars as a mask;forming interconnects by filling a conductive material into the trench;and forming a contact via to connect to a portion of each of theinterconnects having a width wider than widths of the other portions ofthe each of the interconnects.
 13. The method according to claim 12,wherein the protrusion and the recess are formed in side surfaces onmutually opposite sides of the each of the core members in the formingthe core members.
 14. The method according to claim 12, wherein theprotrusion and the recess are formed in same side surface of the each ofthe core members in the forming the core members.
 15. A method formanufacturing an integrated circuit device, comprising: forming aconductive film on a substrate; forming a plurality of core membersextending in one direction on the conductive film, each of the pluralityof core members including a protrusion protruding in a width directionor a recess receding in the width direction formed in one side surfaceof a first portion and a protrusion protruding in the width direction ora recess receding in the width direction formed in one other sidesurface of a second portion; making the core members finer; formingsidewalls on side surfaces of the core members; removing the coremembers; patterning the conductive film into a plurality ofinterconnects by performing etching using the sidewalls as a mask, abent portion being formed in one location of each of the plurality ofinterconnects to curve into a protruding configuration, the plurality ofinterconnects having a first interconnect and a second interconnect, thesecond interconnect being adjacent the first interconnect and disposedin the direction of the protrusion of the bent portion of the firstinterconnect as viewed from the first interconnect; separating anopposing portion of the second interconnect opposing the bent portion ofthe first interconnect from portions of the second interconnect on twosides of the opposing portion while separating the opposing portion fromthe bent portion of the second interconnect; and forming a contact viato connect to the bent portion.
 16. The method according to claim 15,wherein portions of the interconnects extending around two end portionsof the sidewalls also are divided simultaneously in the separating. 17.The method according to claim 16, wherein the separating is performed byetching once using one mask.
 18. The method according to claim 15,wherein the protrusion is formed in the first portion and the recess isformed in the second portion in the forming the core members.
 19. Themethod according to claim 15, wherein the protrusion is formed in boththe first portion and the second portion in the forming the coremembers.
 20. The method according to claim 15, wherein the recess isformed in both the first portion and the second portion in the formingthe core members.
 21. A method for manufacturing an integrated circuitdevice, comprising: forming a conductive film on a substrate; forming aplurality of core members extending in one direction on the conductivefilm, each of the plurality of core members including a protrusionprotruding in a width direction or a recess receding in the widthdirection formed in one side surface of a first portion and a protrusionprotruding in the width direction or a recess receding in the widthdirection formed in one other side surface of a second portion; makingthe core members finer; forming sidewalls on side surfaces of the coremembers; removing the core members; patterning the conductive film intoa plurality of interconnects by performing etching using the sidewallsas a mask, a bent portion being formed in one location of each of theplurality of interconnects to curve into a protruding configuration, theplurality of interconnects having a first interconnect and a secondinterconnect, the second interconnect being adjacent the firstinterconnect, the protrusion of the bent portion of the secondinterconnect being formed in a direction away from the firstinterconnect; separating the bent portion of the first interconnect fromportions of the first interconnect on two sides of the bent portion ofthe first interconnect while separating the bent portion of the firstinterconnect from an opposing portion of the first interconnect, theopposing portion being opposed to the bent portion of the secondinterconnect; and forming a contact via to connect to the opposingportion of each of the interconnects.